返回首頁
 
[ 電子顯微鏡前處理設備 | T.E.M | SCD 500 High Vacuum Sputtering Device ]

SCD 500 高真空濺鍍裝置

SCD 500 的高真空設計,是專為FE-SEM電子顯微鏡應用,及需要超細密金屬覆層的小試片而開發

特色:

薄膜及渦輪分子幫浦組成的無油真空設計,整合於機台內

操作介面簡便

適合不同的金屬靶材

適合應用於高解析FE-SEM覆層

簡潔的工作台

■ SCD 500 High Vacuum Sputtering Device

The SCD 500 is designed for high vacuum coating for applications in electron microscopy and where small samples require metal coatings

 

Feature:

Compact bench top unit

Membrane and turbot molecular pump for oil-free
  vacuum integrated into the housing

Simple user friendly operation

Suitable for various metal targets

Suitable for high resolution FE-SEM coatings